Effect of Conditioning Downforce and Pad Break-In Time on Pad Surface Micro-Texture
نویسندگان
چکیده
منابع مشابه
Pad conditioning in chemical mechanical polishing: a conditioning density distribution model to predict pad surface shape
Abstract: Diamond disc pad conditioning is traditionally employed to restore pad planarity and surface roughness in chemical mechanical polishing (or planarisation) (CMP). In this paper, a conditioning density distribution model is developed to predict the pad surface shape resulted from the diamond disc conditioning in CMP. A kinematic study is carried out to calculate and simulate the diamond...
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ژورنال
عنوان ژورنال: ECS Journal of Solid State Science and Technology
سال: 2018
ISSN: 2162-8769,2162-8777
DOI: 10.1149/2.0271805jss